US and Netherlands Strengthen Export Controls on Chinese Semiconductor Equipment
Export Restrictions Expected on Older DUV Lithography Equipment
The United States and the Netherlands are reportedly set to announce additional measures regarding export controls on semiconductor equipment to China.
According to major foreign media on the 29th (local time), the Dutch government is expected to announce new regulations on the export approval requirements for deep ultraviolet (DUV) lithography equipment produced by ASML, a Dutch semiconductor equipment manufacturer, to China on the 30th.
The new regulations are likely to take effect in September.
The Dutch government has banned exports of ASML's advanced extreme ultraviolet (EUV) lithography equipment to China since 2019. In March of this year, it also announced export restrictions on older generation DUV lithography equipment that uses technology prior to EUV.
At that time, ASML anticipated that the new Dutch government regulations would affect newer DUV lithography equipment. However, foreign media report that exports of older DUV lithography equipment to China are also expected to be restricted.
The U.S. government, after announcing advanced semiconductor and equipment export controls to China in October last year, is preparing additional regulations for six Chinese facilities. These regulations are expected to require prior approval for semiconductor equipment exports to these facilities.
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According to sources, once the new regulations are implemented, products from other foreign companies containing a lower percentage of U.S.-made components than before will also need to obtain U.S. export approval. Lower-tier DUV lithography equipment will also be affected, the sources said. The new regulations are expected to be announced by the end of next month.
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