[Asia Economy Reporter Moon Chaeseok] On the 1st, SK Hynix stated during the earnings conference call for last year and the 4th quarter, "At 1a nanometer (nm), we are applying lithography equipment (EUV) to the process with the greatest cost reduction effect," and explained, "Through mass production and yield stabilization, we have achieved the cost reduction rate of the previous deep ultraviolet (DUV) technology level without applying EUV."


They continued, "It is difficult to definitively say how far and how much EUV will be applied, but for now, we plan to gradually increase the number of EUV applications at 1C nanometer," adding, "We also plan to optimize the equipment for EUV application due to process transition and maintain high efficiency."




[Concall] SK Hynix "Expanding EUV Application Processes" View original image


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