Dong-Eui University and Korea University Joint Research Team Develops Photodiode Array for Quantum Dot Infrared Image Sensors
Aerosol-Assisted Deposition Enables High-Resolution Quantum Dot Photodiode Arrays
Eliminates Photolithography Complexity and Enhances Device Stability
Paves the Way for Commercialization of Next-Generation Infrared Image Sensors
The research team led by Professor Sunghoon Kim of Dong-Eui University and Professor Seungjoo Oh of Korea University has developed a quantum dot photodiode array technology capable of implementing infrared image sensors.
From the left, student Younggyun Choi (PhD program, Korea University), student Youngho Lee (Master's program, Dong-Eui University), Professor Sunghoon Kim (Dong-Eui University), Professor Seungjoo Oh (Korea University). Provided by Dong-Eui University
View original imageThis technology utilizes Aerosol-Assisted Deposition, which enables precise patterning of quantum dot thin films without the need for complex photolithography processes. By doing so, it presents a new direction that could accelerate the commercialization of next-generation quantum dot-based infrared image sensors.
This research was published online in July 2025 in the internationally renowned journal "Chemical Engineering Journal" under the title "High-resolution infrared quantum dot photodiode Array via aerosol-assisted deposition." The study was co-first-authored by Younggyun Choi, a PhD student at Korea University, and Youngho Lee, a master's student at Dong-Eui University. Professors Sunghoon Kim (Dong-Eui University) and Seungjoo Oh (Korea University) served as co-corresponding authors.
This technology features the direct deposition of aerosolized colloidal quantum dots onto substrates, enabling the realization of high-resolution photodiode arrays at a level of 268 ppi while maintaining high photoresponsivity.
In conventional photolithography processes, degradation of the quantum dot surface frequently occurred. However, this new approach fundamentally eliminates such issues and establishes a technological foundation that ensures both the stability and performance of the device.
This result demonstrates the feasibility of a single deposition process technology that enables pixelated patterning without the need for complex photolithography processes.
Overview diagram of photodiode array development for quantum dot-based image sensors.
View original imageThis research was supported by the National Research Foundation of Korea, funded by the Ministry of Science and ICT.
Hot Picks Today
"Could I Also Receive 370 Billion Won?"... No Limit on 'Stock Manipulation Whistleblower Rewards' Starting the 26th
- Samsung Electronics Labor-Management Reach Agreement, General Strike Postponed... "Deficit-Business Unit Allocation Deferred for One Year"
- "From a 70 Million Won Loss to a 350 Million Won Profit with Samsung and SK hynix"... 'Stock Jackpot' Grandfather Gains Attention
- "Stocks Are Not Taxed, but Annual Crypto Gains Over 2.5 Million Won to Be Taxed Next Year... Investors Push Back"
- "Who Is Visiting Japan These Days?" The Once-Crowded Tourist Spots Empty Out... What's Happening?
Professors Seungjoo Oh and Sunghoon Kim stated, "Through this research, we have achieved a significant technological advancement that can be widely applied to next-generation SWIR sensors, gas sensors, displays, as well as in the fields of optoelectronic and energy devices."
© The Asia Business Daily(www.asiae.co.kr). All rights reserved.