Invenia Acquires Patent Rights for Plasma Treatment Device

by Keum Boryeong

Published 25 Sep.2020 11:32(KST)

[Asia Economy Reporter Geum Bo-ryeong] Invenia announced on the 25th that it has acquired a patent for the 'Antenna Assembly for Inductively Coupled Plasma Processing Device and an Inductively Coupled Plasma Processing Device Equipped with the Same.'

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Invenia stated, "It is planned to be primarily applied to large-area dry etching equipment," adding, "This will enhance the technological level of next-generation inductively coupled plasma type dry etching equipment."

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